| Titre : |
Ir coating prepared on Mo substrate by double glow plasma |
| Type de document : |
texte imprimé |
| Auteurs : |
Wang Liangbing, Auteur ; Zhaofeng Chen, Auteur ; Pingze Zhang, Auteur ; Wangping Wu, Auteur ; Ying Zhang, Auteur |
| Année de publication : |
2009 |
| Article en page(s) : |
p. 517-522 |
| Note générale : |
Bibliogr. |
| Langues : |
Américain (ame) |
| Index. décimale : |
667.9 Revêtements et enduits |
| Résumé : |
Dense and adherent Ir coating was obtained on the surface of the Mo substrate by double glow plasma, which had a deposition chamber and two cathodes. Argon gas was used as the working gas. The bias voltage of Ir target and Mo substrate were -800 and -300 V, respectively. The chamber pressure was 35 Pa. Microstructure of the Ir coating was observed by scanning electron microscopy. The Ir coating had a polycrystalline structure with preferential growth orientation of (220) crystal plane. The deposition rate was ~3.5 µm/h. The good adhesion resulted from the buffer layer between the Mo substrate and the Ir coating. The buffer layer, a combined Ir and Mo, was formed at the beginning of the deposition. The Mo concentration distributed gradiently along the depth of the buffer layer. |
| DOI : |
10.1007/s11998-008-9123-7 |
| En ligne : |
https://link.springer.com/content/pdf/10.1007%2Fs11998-008-9123-7.pdf |
| Format de la ressource électronique : |
Pdf |
| Permalink : |
https://e-campus.itech.fr/pmb/opac_css/index.php?lvl=notice_display&id=7695 |
in JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH > Vol. 6, N° 4 (12/2009) . - p. 517-522
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Ir coating prepared on Mo substrate by double glow plasma in JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH, Vol. 6, N° 4 (12/2009)
