| Titre : |
Effect of sputtering parameters on the self-cleaning properties of amorphous titanium dioxide thin films |
| Type de document : |
texte imprimé |
| Année de publication : |
2017 |
| Article en page(s) : |
p. 1423-1433 |
| Note générale : |
Bibliogr. |
| Langues : |
Américain (ame) |
| Catégories : |
Couches minces
Dioxyde de titane
Hydrophilie
Magnétron
Matériaux amorphes
Photocatalyse
Pulvérisation
Revêtement auto-nettoyant
|
| Index. décimale : |
667.9 Revêtements et enduits |
| Résumé : |
The aim of this work was to assess the effect of the direct current magnetron sputtering parameters on the photocatalytic activity and photoinduced wettability of amorphous TiO2 films. TiO2 films were deposited on glass using the direct current magnetron sputtering technique, without heating, at different total working pressures. Qualitative analysis using in situ X-ray photoelectron spectroscopy confirmed the TiO2 stoichiometry of the deposited films. Surface structure was studied as a function of working pressure using scanning electron microscopy. The hydrophilicity of the TiO2 surfaces was investigated macroscopically using measurements of the water contact angle. A threshold working pressure was observed, with a strong dependence on the film thickness. A super hydrophilic surface was observed after less than 1 h of UV irradiation. The photocatalytic activity of the films was evaluated under UV light through the degradation of methylene blue (λmax≈660nm). The effect of UV irradiation on the photocatalytic activity was rapid, strong, and dependent on film thickness and total working pressure. Fifty percent of organic compounds were photodegraded by films with a thickness of 60 nm deposited at 10 mTorr. |
| Note de contenu : |
- EXPERIMENTAL DETAILS : Sample preparation - Contact angle measurements - Photocatalytic tests - X-ray photoelectron spectroscopic analysis - Characterization
- RESULTS AND DISCUSSION : TiO2 film deposition - Structural characterization - Photoinduced superhydrophilicity - Photocatalytic activity |
| DOI : |
10.1007/s11998-017-9928-3 |
| En ligne : |
https://link.springer.com/content/pdf/10.1007%2Fs11998-017-9928-3.pdf |
| Format de la ressource électronique : |
Pdf |
| Permalink : |
https://e-campus.itech.fr/pmb/opac_css/index.php?lvl=notice_display&id=29654 |
in JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH > Vol. 14, N° 6 (11/2017) . - p. 1423-1433
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Effect of sputtering parameters on the self-cleaning properties of amorphous titanium dioxide thin films in JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH, Vol. 14, N° 6 (11/2017)
