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On the stability of delamination growth at scratching of thin film structures / Fredrik Wredenberg in JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH, Vol. 8, N° 6 (11/2011)

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inJOURNAL OF COATINGS TECHNOLOGY AND RESEARCH > Vol. 8, N° 6 (11/2011) . - p. 707-717

Titre :	On the stability of delamination growth at scratching of thin film structures
Type de document :	texte imprimé
Auteurs :	Fredrik Wredenberg, Auteur ; Per-Lennart Larsson, Auteur
Année de publication :	2011
Article en page(s) :	p. 707-717
Note générale :	Bibliogr.
Langues :	Américain (ame)
Catégories :	Couches minces -- Stabilité Délaminage Eléments finis, Méthode des Rayures
Index. décimale :	667.9 Revêtements et enduits
Résumé :	Scratching of thin film/substrate structures is studied theoretically and numerically. The results are discussed in connection to delamination initiation and in particular subsequent growth at scratching. The material behavior of the film is described by classical elastoplasticity accounting for large deformations. The deformation of the substrate is neglected indicating that the results are pertinent to soft thin films. The numerical investigation is performed using the finite element method (FEM) and the numerical strategy is discussed in some detail. The results from this study show that delamination growth at thin film scratching is a stable feature with crack arrest occurring at a decreasing load.
Note de contenu :	- Basic considerations and numerical analysis - Delamination analysis - Results and discussion
DOI :	10.1007/s11998-011-9352-z
En ligne :	https://link.springer.com/content/pdf/10.1007%2Fs11998-011-9352-z.pdf
Format de la ressource électronique :	Pdf
Permalink :	https://e-campus.itech.fr/pmb/opac_css/index.php?lvl=notice_display&id=12597

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