[article]
| Titre : |
Physicochemical properties of cetyltributylphosphonium bromide in the presence of additives |
| Type de document : |
texte imprimé |
| Auteurs : |
D. Tikariha, Auteur ; K. K. Ghosh, Auteur |
| Année de publication : |
2011 |
| Article en page(s) : |
p. 308-311 |
| Note générale : |
Bibliogr. |
| Langues : |
Anglais (eng) |
| Catégories : |
Surfactants
|
| Tags : |
'Surfactants monomériques' cationiques' 'Non-électrolyte' 'Thermodynamique micellisation' 'Effets additifs' 'Concentration micellaire critique' |
| Index. décimale : |
668.1 Agents tensioactifs : savons, détergents |
| Résumé : |
Physicochemical behavior of cetyltributylphosphonium bromide (CTBuPB) surfactant in presence of additives (urea, thiourea and sucrose) has been studied by conductometric measurement at 303–320 K. The critical micelle concentration (CMC) and degree of micellar ionization (α), increases with increasing concentration of additives (urea, thiourea and sucrose). The standard Gibbs free energy of micellization (ΔG0m), enthalpy of micellization (ΔH0m) and entropy of micellization, (ΔS0m), have been obtained by applying the mass action model. The free energy and enthalpy of micellization have found to be negative in all the systems. |
| Permalink : |
https://e-campus.itech.fr/pmb/opac_css/index.php?lvl=notice_display&id=11950 |
in TENSIDE, SURFACTANTS, DETERGENTS > Vol. 48, N° 4/2011 (07-08/2011) . - p. 308-311
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Physicochemical properties of cetyltributylphosphonium bromide in the presence of additives in TENSIDE, SURFACTANTS, DETERGENTS, Vol. 48, N° 4/2011 (07-08/2011)
